MOCVD Systems


MOCVD. MATHESON’s parent company, Taiyo Nippon Sanso Corporation (TNSC), was the first to develop Metal Organic Chemical Vapor Deposition equipment to produce compound semiconductors.


Compound semiconductors are used in liquid crystal displays (LCDs) and in blue and white LEDs, as well as in power electronics, ultraviolet light, and RF applications. 

This equipment is well-known worldwide for its exceptionally stable performance. 

With TNSC’s world class MOCVD equipment as the focal point, MATHESON is uniquely qualified to provide end-to-end solutions for MOCVD users in North America and other parts of the world.

MATHESON’s Core Competencies Complete the Solution

MATHESON complements the world class TNSC MOCVD Equipment with its own world class competencies in materials, gases, equipment, and site services. 

These offerings include systems engineering, piping design and installation services, materials and gases, all applicable gas handling equipment, analysis and monitoring systems, specialized Cl2 dry cleaning systems, purification, and exhaust gas abatement solutions.

Further, MATHESON Site Services is positioned to manage and maintain – and even staff – your gas-usage operations … thereby delivering a true “end-to-end” MOCVD production solution.

MOCVD Production Systems

Every MOCVD “Tool” is individually customized to customer requirements, but there are 12 core system models from which to choose, depending on production requirements.

Gas Flow Design

To promote uniformity of surface reactions, gas flow geometry and control is critical. Two proprietary designs, one incorporating side-positioned gas inlets, and the other featuring center-out radial gas dispersion, both ensure well-controlled precursor dispersion, stable operation, and maximum results.

Side Inlet
Side Inlet Design illustration




TNSC MOCVD tools are designed so that the liners can be replaced quickly without chamber disassembly, which results in a big improvement in productive uptime. Some models are designed with provisions for robotic transfer of cleaning parts – for additional uptime improvement.

Other TNSC MOCVD Reactor Features

  • Flexible support for various customer needs including MOCVD system configuration, heating system, etc.
  • Automated transfer of wafer holder and ceiling plate
  • Three-layer laminar flow gas injection
  • Control of wafer temperature distribution by external power input balance
  • Control of Al composition distribution in a bowing wafer
  • Only TNSC MOCVD can provide atmospheric pressure growth
  • Systems for 2, 3, 4, 6, or 8 inch wafers




Learn more about TNSC MOCVD and how MATHESON can support your MOCVD Production Efficiencies. 
Download the Brochure.

Request Additional Information

Websites and brochures are just the beginning. Contact us directly to begin an exploration of your system requirements and our system solutions. We welcome your query.




Also see:

MOCVD Product Gallery

Contact Information and Useful Links


mocvd list

Axial Inlet Diagram
Axial Inlet Design illustration