A Global leader in electronics fabrication.
MATHESON, together with parent company Nippon Sanso Holdings Corporation, is one of the largest providers of gases and materials for electronics and semiconductor fabrication on the planet.
As a global leader among suppliers of gases and materials for semiconductor fabrication, MATHESON is a sustainable source for your gas supply requirements. You can be confident that your gases are produced, purified, and packaged to world class quality and safety standards.
Depend on MATHESON not only for gases and materials, but for comprehensive site services as well.
Search Semiconductor-grade Gases
| Formula | Gas Name | Specs |
|---|---|---|
| Ar | Argon | Cylinders |
| AsH3 | Arsine | Cylinders |
| AsH3 | Arsine Two-Component Mixture | Cylinders |
| B2H6 | Diborane Two-Component Mixture | Cylinders |
| BCl3 | Boron Trichloride | Cylinders |
| BF3 | Boron Trifluoride | Cylinders |
| C2F6 | Halocarbon 116 (Hexafluoroethane) | Cylinders |
| C2H4 | Ethylene | Cylinders |
| C2H6 | Ethane | Cylinders |
| C3F8 | Halocarbon 218 (Perfluoropropane) | Cylinders |
| C3H6 | Propylene | Cylinders |
| C4F8 | Halocarbon C318 (Octafluorocyclobutane) | Cylinders |
| C5F8 | Halocarbon 4110 (Octafluorocyclopentene) | Cylinders |
| CF4 | Halocarbon 14 (Carbon Tetrafluoride) (Tetrafluoromethane) | Cylinders |
| CH2F2 | Halocarbon 32 (Difluoromethane) | Cylinders |
| CH3F | Halocarbon 41 (Methyl Fluoride) | Cylinders |
| CH4 | Methane | Cylinders |
| CHF3 | Halocarbon 23 (Trifluoromethane) | Cylinders |
| Cl2 | Chlorine | Cylinders |
| CO | Carbon Monoxide | Cylinders |
| CO2 | Carbon Dioxide | Cylinders |
| COS | Carbonyl Sulfide | Cylinders |
| D2 | Deuterium | Cylinders |
| GeH4 | Germane | Cylinders |
| H2 | Hydrogen | Cylinders |
| H2S | Hydrogen Sulfide | Cylinders |
| H2Se | Hydrogen Selenide | Cylinders |
| HBr | Hydrogen Bromide | Cylinders |
| HCl | Hydrogen Chloride | Cylinders |
| He | Helium | Cylinders |
| HF | Hydrogen Fluoride | Cylinders |
| Kr | Krypton | Cylinders |
| N2 | Nitrogen | Cylinders |
| N2O | Nitrous Oxide | Cylinders |
| Ne | Neon | Cylinders |
| NF3 | Nitrogen Trifluoride | Cylinders |
| NH3 | Ammonia | Cylinders |
| NO | Nitric Oxide | Cylinders |
| O2 | Oxygen | Cylinders |
| PH3 | Phosphine | Cylinders |
| PH3 | Phosphine Two-Component Mixture | Cylinders |
| SF6 | Sulfur Hexafluoride | Cylinders |
| Si2H6 | Disilane | Cylinders |
| Si3H8 | Silcore | Cylinders |
| SiCl4 | Silicon Tetrachloride | Cylinders |
| SiF4 | Silicon Tetrafluoride | Cylinders |
| SiH(CH3)3 | Trimethylsilane | Cylinders |
| SiH2Cl2 | Dichlorosilane | Cylinders |
| SiH3CH3 | Methyl Silane | Cylinders |
| SiH4 | Silane | Cylinders |
| SiH4 | Silane Two-Component Mixture | Cylinders |
| SiHCl3 | Trichlorosilane | Cylinders |
| WF6 | Tungsten Hexafluoride | Cylinders |
| Xe | Xenon | Cylinders |
Gas Purification
Nanochem® Gas Purifiers enable ultrapurification of gases used in wafer and semiconductor fabrication, including the removal of dopants and volatile metals.
Below is a list of gases we purify. If the gas material of interest to you does not appear in this list, please contact us:
| Gas | |
|---|---|
| Air | Air |
| Ar | Argon |
| Ar (weld) | Argon (welding) |
| AsH3 | Arsine |
| AsH3 | Arsine (1-10%) |
| BCl3 | Boron Trichloride |
| BF3 | Boron Trifluoride |
| C2F6 | Hexafluoroethane |
| C2H2 | Acetylene |
| C2H4 | Ethylene |
| C2H6 | Ethane |
| C3F6 | Hexafluoropropylene |
| C3F8 | Octafluoropropane |
| C3H6 | Propylene |
| C3H8 | Propane |
| C4F10 | Perfluorobutane |
| C4F6 | Hexafluorobutadiene |
| C4F8 | Octafluorocyclobutane |
| C4H10 | Butane |
| C4H10 | Isobutane |
| C4H8 | Butene |
| C5F8 | Octafluorocyclopentene |
| CCl2O | Phosgene |
| CCl4 | Carbon Tetrachloride |
| CDA | Clean Dry Air |
| CF4 | Carbon Tetrafluoride |
| CH2F2 | Difluoromethane |
| CH3Cl | Methyl Chloride |
| CH3SH | Methyl Mercaptan |
| CH3SiH3 | Monomethyl Silane |
| CH4 | Methane |
| CH3F | Methyl Fluoride |
| CHF3 | Trifluoromethane |
| Chlorocarbons | Chlorocarbons |
| Cl2 | Chlorine |
| CO | Carbon Monoxide |
| CO2 | Carbon Dioxide |
| COS | Carbonyl Sulfide |
| CS2 | Carbon Disulfide |
| Cyclo-hydrocarbons | Cyclo-hydrocarbons |
| D2 | Deuterium |
| Fluorocarbons | Fluorocarbons |
| GeCl4 | Germanium Tetrachloride |
| GeF4 | Germanium Tetrafluoride |
| GeH4 | Germane |
| GeH4 | Germane (1-10%) |
| H2 | Hydrogen |
| H2S | Hydrogen Sulfide |
| H2Se | Hydrogen Selenide |
| Halocarbons | Halocarbons |
| HBr | Hydrogen Bromide |
| HCl | Hydrogen Chloride |
| He | Helium |
| HF | Hydrogen Fluoride |
| Hydrocarbons | Hydrocarbons |
| Kr | Krypton |
| N2 | Nitrogen |
| N2O | Nitrous Oxide |
| Ne | Neon |
| NH3 | Ammonia |
| NO | Nitric Oxide |
| NO2 | Nitrogen Dioxide |
| O2 | Oxygen |
| O3 | Ozone |
| PH3 | Phosphine |
| PH3 | Phosphine (1-10%) |
| SF6 | Sulfur Hexafluoride |
| Si2H6 | Disilane |
| SiCl4 | Silicon Tetrachloride |
| SiClH3 | Monochlorosilane |
| SiCl2H2 | Dichlorosilane |
| SiCl3H2 | Trichlorosilane |
| SiF4 | Silicon Tetrafluoride |
| SiH3CH3 | Methyl Silane |
| SiH4 | Silane |
| SO2 | Sulfur Dioxide |
| Xe | Xenon |
UHP Gas Equipment
As solution providers for semiconductor manufacturing, MATHESON offers equipment systems for ultra-purification, UHP gas delivery, and precision UHP gas control.
MATHESON’s Ultra-High Purity Equipment and Purification Technology Team is positioned to resolve the most challenging ultra-high purity gas management and purification requirements.
Whether you require process gas modules or advanced turnkey process systems, MATHESON will collaborate with you from concept, to prototype, to optimized production.
